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Systematic Approach to Higher Fe Doping in CuO Materials


Authors : Digvijay Gore; Abhilash Phulmante; Chandrakant Londhe

Volume/Issue : Volume 11 - 2026, Issue 3 - March


Google Scholar : https://tinyurl.com/j4phbxj3

Scribd : https://tinyurl.com/4xe5pdpu

DOI : https://doi.org/10.38124/ijisrt/26mar793

Note : A published paper may take 4-5 working days from the publication date to appear in PlumX Metrics, Semantic Scholar, and ResearchGate.


Abstract : In the present work, pure and Fe-doped CuO thin films were successfully deposited onto glass substrates using the spray pyrolysis technique. The influence of Fe incorporation on the structural and morphological properties of CuO thin films was systematically investigated. X-ray diffraction (XRD) analysis confirmed the formation of monoclinic CuO with good crystallinity. The diffraction peaks observed in the patterns correspond to the characteristic reflections of CuO, and their intensity and sharpness were noticeably enhanced after Fe doping, indicating improved crystalline quality of the films without the presence of secondary phases. Field emission scanning electron microscopy (FE-SEM) was employed to examine the surface morphology of the deposited films. Fe-doped CuO film (7%) showed a more uniform and compact morphology consisting of well-defined spherical grains. The incorporation of Fe significantly modified the growth behavior of CuO, resulting in improved surface uniformity. These results show the doping importance of Fe the potential applications in electronic and sensing devices.

Keywords : CuO, Fe, Spray Pyrolysis, Thin Film, XRD, FE-SEM.

References :

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  2. Chafi, F. Z., Salmani, E., Bahmad, L., Hassanain, N., Fares, B., & Mzerd, A. (2018). First-principles calculations of electronic properties of Fe-doped CuO compounds. Journal of Electronic Materials. https://doi.org/10.48550/arXiv.1807.06319
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In the present work, pure and Fe-doped CuO thin films were successfully deposited onto glass substrates using the spray pyrolysis technique. The influence of Fe incorporation on the structural and morphological properties of CuO thin films was systematically investigated. X-ray diffraction (XRD) analysis confirmed the formation of monoclinic CuO with good crystallinity. The diffraction peaks observed in the patterns correspond to the characteristic reflections of CuO, and their intensity and sharpness were noticeably enhanced after Fe doping, indicating improved crystalline quality of the films without the presence of secondary phases. Field emission scanning electron microscopy (FE-SEM) was employed to examine the surface morphology of the deposited films. Fe-doped CuO film (7%) showed a more uniform and compact morphology consisting of well-defined spherical grains. The incorporation of Fe significantly modified the growth behavior of CuO, resulting in improved surface uniformity. These results show the doping importance of Fe the potential applications in electronic and sensing devices.

Keywords : CuO, Fe, Spray Pyrolysis, Thin Film, XRD, FE-SEM.

Paper Submission Last Date
31 - March - 2026

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